Title :
An analytical model for static characteristics of a Pseudo-MOS transistor with neutral channel
Author_Institution :
Politehnica Univ., Bucharest, Romania
Abstract :
The Pseudo-MOS transistor can be obtained on all SOI structure, without any lithographic technique. The aim of this paper is to give an accurate model for the volume current of an ψ-MOSFET, when a non-uniform neutral channel between source and drain exists. A possible application is that in the domain of the microsensors in SOI technology, that implies the conduction through neutral channel. The PISCES simulations and analytical models are 2-dimensional. Some experiments on pseudo-MOS transistor manufactured in SIMOX technique are achieved to validate the analytical model
Keywords :
MOSFET; SIMOX; semiconductor device models; PISCES; Pseudo-MOS transistor; SIMOX technology; SOI structure; analytical model; microsensor; neutral channel; static characteristics; two-dimensional simulation; volume current; Analytical models; Conductive films; Conductivity; Dielectric substrates; Insulation; MOSFET circuits; Research and development; Semiconductor device doping; Semiconductor films; Voltage;
Conference_Titel :
Semiconductor Conference, 2000. CAS 2000 Proceedings. International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-5885-6
DOI :
10.1109/SMICND.2000.890241