DocumentCode :
1745577
Title :
Transformation of implantation induced interstitial point defects in dislocation loops
Author :
Starostenkov, Michail D. ; Poletayev, Gennadiy M. ; Starostenkov, Dmitriy M.
Author_Institution :
Dept. of Gen. Phys., Altai State Univ., Barnaul, Russia
fYear :
2000
fDate :
2000
Firstpage :
123
Lastpage :
126
Abstract :
The condition of the transformation of interstitial point defects in dislocations and dislocation loops was investigated by the method of molecular dynamics. Solid Al was taken as a basis of the investigation. Interstitial atoms were implanted in the crystal by ion beam procedure. The energy of the implanted atoms of this process was dissipated at the modelling block of the crystal. Interaction between atoms in the lattice was described by the pair interatomic potentials. Structural transformation of the lattice was investigated at the different temperatures. Al and Ni were taken as the interstitial atoms. Structure-energetical transformations of the lattice near the point interstitial defects were connected with the formation of domains, divided by boundaries, which can be considered as crowdions at low temperature. The structure of the crystal was transformed with the appearance of dislocations or dislocation loops with the growth of temperature near a pair of interstitial atoms
Keywords :
aluminium alloys; crowdions; dislocation interactions; dislocation loops; interstitials; ion implantation; molecular dynamics method; nickel alloys; potential energy functions; AlNi; Ni; crowdions; crystal; dislocation loops; domains; implantation induced interstitial point defects; implanted atoms; interstitial atoms; low temperature; molecular dynamics; pair interatomic potentials; point interstitial defects; solid Al; structural transformation; structure-energetical transformations; transformation; Artificial intelligence; Atomic beams; Atomic layer deposition; Crystalline materials; Ion beams; Ion implantation; Lattices; Physics; Solids; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
Type :
conf
DOI :
10.1109/.2000.924106
Filename :
924106
Link To Document :
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