DocumentCode
1745577
Title
Transformation of implantation induced interstitial point defects in dislocation loops
Author
Starostenkov, Michail D. ; Poletayev, Gennadiy M. ; Starostenkov, Dmitriy M.
Author_Institution
Dept. of Gen. Phys., Altai State Univ., Barnaul, Russia
fYear
2000
fDate
2000
Firstpage
123
Lastpage
126
Abstract
The condition of the transformation of interstitial point defects in dislocations and dislocation loops was investigated by the method of molecular dynamics. Solid Al was taken as a basis of the investigation. Interstitial atoms were implanted in the crystal by ion beam procedure. The energy of the implanted atoms of this process was dissipated at the modelling block of the crystal. Interaction between atoms in the lattice was described by the pair interatomic potentials. Structural transformation of the lattice was investigated at the different temperatures. Al and Ni were taken as the interstitial atoms. Structure-energetical transformations of the lattice near the point interstitial defects were connected with the formation of domains, divided by boundaries, which can be considered as crowdions at low temperature. The structure of the crystal was transformed with the appearance of dislocations or dislocation loops with the growth of temperature near a pair of interstitial atoms
Keywords
aluminium alloys; crowdions; dislocation interactions; dislocation loops; interstitials; ion implantation; molecular dynamics method; nickel alloys; potential energy functions; AlNi; Ni; crowdions; crystal; dislocation loops; domains; implantation induced interstitial point defects; implanted atoms; interstitial atoms; low temperature; molecular dynamics; pair interatomic potentials; point interstitial defects; solid Al; structural transformation; structure-energetical transformations; transformation; Artificial intelligence; Atomic beams; Atomic layer deposition; Crystalline materials; Ion beams; Ion implantation; Lattices; Physics; Solids; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology, 2000. Conference on
Conference_Location
Alpbach
Print_ISBN
0-7803-6462-7
Type
conf
DOI
10.1109/.2000.924106
Filename
924106
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