DocumentCode
1746793
Title
Photoluminescence dependence on heterointerface for MOCVD grown GaInNAs/GaAs QWs
Author
Kawaguchi, M. ; Miyamoto, T. ; Gouardes, E. ; Kondo, T. ; Koyama, F. ; Iga, K.
Author_Institution
Precision & Intelligence Lab., Tokyo Inst. of Technol., Yokohama, Japan
fYear
2001
fDate
2001
Firstpage
559
Lastpage
562
Abstract
We investigated the effect of the gas flow sequence of dimethylhydrazine (DMHy) at heterointerfaces on the optical quality of GaInNAs/GaAs grown by metalorganic chemical vapor deposition (MOCVD). We point out that the photoluminescence (PL) degradation of GaInNAs grown by MOCVD can be categorized into two types. One is the formation of a GaNAs layer at the interface which causes both an unexpected wavelength extension and degradation of crystal quality. Another is introduction of non-radiative centers by N incorporation itself. To overcome these degradation mechanisms, the insertion of GaInAs to the GaInNAs/GaAs heterointerface is proposed. A GaInAs intermediate layer (IML) suppresses GaNAs formation and improve the optical quality of GaInNAs QWs
Keywords
III-V semiconductors; MOCVD coatings; gallium arsenide; indium compounds; nonradiative transitions; photoluminescence; semiconductor growth; semiconductor quantum wells; GaInAs intermediate layer; GaInNAs-GaAs; GaInNAs/GaAs quantum well; dimethylhydrazine; gas flow sequence; heterointerface; metalorganic chemical vapor deposition; nonradiative center; optical quality; photoluminescence; Degradation; Fluid flow; Gallium arsenide; Indium phosphide; Inductors; MOCVD; Optical buffering; Photoluminescence; Surface emitting lasers; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On
Conference_Location
Nara
ISSN
1092-8669
Print_ISBN
0-7803-6700-6
Type
conf
DOI
10.1109/ICIPRM.2001.929210
Filename
929210
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