• DocumentCode
    1746793
  • Title

    Photoluminescence dependence on heterointerface for MOCVD grown GaInNAs/GaAs QWs

  • Author

    Kawaguchi, M. ; Miyamoto, T. ; Gouardes, E. ; Kondo, T. ; Koyama, F. ; Iga, K.

  • Author_Institution
    Precision & Intelligence Lab., Tokyo Inst. of Technol., Yokohama, Japan
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    559
  • Lastpage
    562
  • Abstract
    We investigated the effect of the gas flow sequence of dimethylhydrazine (DMHy) at heterointerfaces on the optical quality of GaInNAs/GaAs grown by metalorganic chemical vapor deposition (MOCVD). We point out that the photoluminescence (PL) degradation of GaInNAs grown by MOCVD can be categorized into two types. One is the formation of a GaNAs layer at the interface which causes both an unexpected wavelength extension and degradation of crystal quality. Another is introduction of non-radiative centers by N incorporation itself. To overcome these degradation mechanisms, the insertion of GaInAs to the GaInNAs/GaAs heterointerface is proposed. A GaInAs intermediate layer (IML) suppresses GaNAs formation and improve the optical quality of GaInNAs QWs
  • Keywords
    III-V semiconductors; MOCVD coatings; gallium arsenide; indium compounds; nonradiative transitions; photoluminescence; semiconductor growth; semiconductor quantum wells; GaInAs intermediate layer; GaInNAs-GaAs; GaInNAs/GaAs quantum well; dimethylhydrazine; gas flow sequence; heterointerface; metalorganic chemical vapor deposition; nonradiative center; optical quality; photoluminescence; Degradation; Fluid flow; Gallium arsenide; Indium phosphide; Inductors; MOCVD; Optical buffering; Photoluminescence; Surface emitting lasers; Vertical cavity surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On
  • Conference_Location
    Nara
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-6700-6
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2001.929210
  • Filename
    929210