• DocumentCode
    1752027
  • Title

    Micro cone detector

  • Author

    Suyama, D. ; Kawarabayashi, J. ; Uritani, A. ; Iguchi, T.

  • Author_Institution
    Nagoya Univ., Japan
  • Volume
    1
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    29707
  • Abstract
    We proposed and designed a new type of two dimensional detector that has cone shape structure. This detector consists the cone shape electrode and the hole shape electrode. A wet anisotropic etching and photolithography were performed to fabricate this detector. Simulation was performed in order to optimize the structural design and estimate the performance. From the simulation result, gas gain of 103 to 104 was obtained. Also, rise time of less than 10 micro seconds were calculated and reduction of charge accumulation on the insulator were estimated. A preliminary test fabrication was made and the signal from anode cone was successfully observed with this device
  • Keywords
    etching; photolithography; position sensitive particle detectors; proportional counters; cone shape electrode; cone shape structure; hole shape electrode; micro cone detector; photolithography; wet anisotropic etching; Anisotropic magnetoresistance; Design optimization; Detectors; Electrodes; Fabrication; Insulation; Lithography; Shape; Testing; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nuclear Science Symposium Conference Record, 2000 IEEE
  • Conference_Location
    Lyon
  • ISSN
    1082-3654
  • Print_ISBN
    0-7803-6503-8
  • Type

    conf

  • DOI
    10.1109/NSSMIC.2000.949087
  • Filename
    949087