DocumentCode :
1752027
Title :
Micro cone detector
Author :
Suyama, D. ; Kawarabayashi, J. ; Uritani, A. ; Iguchi, T.
Author_Institution :
Nagoya Univ., Japan
Volume :
1
fYear :
2000
fDate :
2000
Firstpage :
29707
Abstract :
We proposed and designed a new type of two dimensional detector that has cone shape structure. This detector consists the cone shape electrode and the hole shape electrode. A wet anisotropic etching and photolithography were performed to fabricate this detector. Simulation was performed in order to optimize the structural design and estimate the performance. From the simulation result, gas gain of 103 to 104 was obtained. Also, rise time of less than 10 micro seconds were calculated and reduction of charge accumulation on the insulator were estimated. A preliminary test fabrication was made and the signal from anode cone was successfully observed with this device
Keywords :
etching; photolithography; position sensitive particle detectors; proportional counters; cone shape electrode; cone shape structure; hole shape electrode; micro cone detector; photolithography; wet anisotropic etching; Anisotropic magnetoresistance; Design optimization; Detectors; Electrodes; Fabrication; Insulation; Lithography; Shape; Testing; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nuclear Science Symposium Conference Record, 2000 IEEE
Conference_Location :
Lyon
ISSN :
1082-3654
Print_ISBN :
0-7803-6503-8
Type :
conf
DOI :
10.1109/NSSMIC.2000.949087
Filename :
949087
Link To Document :
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