• DocumentCode
    1753965
  • Title

    A novel electron beam-inspection technique for high-impedance contact plugs

  • Author

    Ominami, Yusuke ; Tsuno, N. ; Nozoe, M. ; Oh, J.H. ; Yoo, H.W. ; Lee, J.P. ; Mun, D.Y.

  • Author_Institution
    Hitachi High-Technol. Corp., Hitachinaka, Japan
  • fYear
    2010
  • fDate
    18-20 Oct. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    We here present a novel electron beam inspection technique for non-annealed high impedance poly-Si plugs. At this new method, interval time between each electron beam scan is varied to enhance the difference of surface voltage of normal plug, disconnected plug and SiO2. Based on experimental results using our experimental tool with the new interval scan technique, contrast between SiO2 and poly-Si plug, between normal plug and disconnected plug have been dramatically enhanced.
  • Keywords
    electric connectors; electron beam applications; inspection; silicon compounds; SiO2; electron beam inspection technique; high-impedance contact plug; interval scan technique; Detectors; Electron beam applications; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM), 2010 International Symposium on
  • Conference_Location
    Tokyo
  • ISSN
    1523-553X
  • Print_ISBN
    978-1-4577-0392-8
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • Filename
    5750234
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1753965