• DocumentCode
    1753974
  • Title

    Effective start up study and factor analysis for lithography process filter

  • Author

    Umeda, Toru ; Tsuzuki, Shuichi ; Numaguchi, Toru

  • Author_Institution
    Nihon Pall Ltd., Ami, Japan
  • fYear
    2010
  • fDate
    18-20 Oct. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In order to drive reduced chemical consumption, effective tool operation, effective utilization of next-generation filtration products, and environmental benefits, greater demands will be placed on the development of effective start up procedures for point-of-use filters in advanced lithography resist coating processes. The current study evaluates the effectiveness of two procedural methods, static pressure driven fluid delivery and fluid deaeration, on filter start up improvement. Further, factor analysis revealed inlet pressure to have a significant impact on filter start up quality.
  • Keywords
    coatings; filtration; lithography; advanced lithography resist coating processes; chemical consumption; environmental benefits; factor analysis; fluid deaeration; lithography process filter; next-generation filtration products; point-of-use filters; start up procedures; static pressure driven fluid delivery; Fluids; Regulators; Transducers; Valves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM), 2010 International Symposium on
  • Conference_Location
    Tokyo
  • ISSN
    1523-553X
  • Print_ISBN
    978-1-4577-0392-8
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • Filename
    5750243