DocumentCode
1753974
Title
Effective start up study and factor analysis for lithography process filter
Author
Umeda, Toru ; Tsuzuki, Shuichi ; Numaguchi, Toru
Author_Institution
Nihon Pall Ltd., Ami, Japan
fYear
2010
fDate
18-20 Oct. 2010
Firstpage
1
Lastpage
4
Abstract
In order to drive reduced chemical consumption, effective tool operation, effective utilization of next-generation filtration products, and environmental benefits, greater demands will be placed on the development of effective start up procedures for point-of-use filters in advanced lithography resist coating processes. The current study evaluates the effectiveness of two procedural methods, static pressure driven fluid delivery and fluid deaeration, on filter start up improvement. Further, factor analysis revealed inlet pressure to have a significant impact on filter start up quality.
Keywords
coatings; filtration; lithography; advanced lithography resist coating processes; chemical consumption; environmental benefits; factor analysis; fluid deaeration; lithography process filter; next-generation filtration products; point-of-use filters; start up procedures; static pressure driven fluid delivery; Fluids; Regulators; Transducers; Valves;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM), 2010 International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
978-1-4577-0392-8
Electronic_ISBN
1523-553X
Type
conf
Filename
5750243
Link To Document