• DocumentCode
    1756896
  • Title

    Range Extension of a Bimorph Varifocal Micromirror Through Actuation by a Peltier Element

  • Author

    Paterson, Alan ; Bauer, Ralf ; Li Li ; Lubeigt, Walter ; Uttamchandani, Deepak

  • Author_Institution
    Dept. of Electron. & Electr. Eng., Univ. of Strathclyde, Glasgow, UK
  • Volume
    21
  • Issue
    4
  • fYear
    2015
  • fDate
    July-Aug. 2015
  • Firstpage
    72
  • Lastpage
    78
  • Abstract
    A bimorph varifocal micromirror actuated thermoelectrically by a Peltier element is reported. The single-crystal silicon micromirror is 1.2 mm in diameter with a centered 1-mm-diameter gold coating for broadband reflection. The actuation principle is capable of varying the micromirror temperature above and below the ambient temperature, which contributed to a 57% improvement in the addressable curvature range in comparison to previously reported electrothermal and optothermal actuation techniques for the device. Altering the device temperature from 10 °C to 100 °C provided a mirror surface radius of curvature variation from 19.2 to 30.9 mm, respectively. The experimental characterization of the micromirror was used as a basis for accurate finite-element modeling of the device and its actuation. Negligible optical aberrations are observed over the operating range, enabling effectively aberration-free imaging. Demonstration in an optical imaging system illustrated sharp imaging of objects over a focal plane variation of 212 mm.
  • Keywords
    aberrations; elemental semiconductors; finite element analysis; focal planes; micromirrors; optical images; silicon; thermoelectric devices; Peltier element; Si; aberration-free imaging; actuation; bimorph varifocal micromirror; broadband reflection; electrothermal actuation; finite element modeling; focal plane; optical aberrations; optical imaging system; optothermal actuation; radius 19.2 mm to 30.9 mm; range extension; sharp imaging; single-crystal silicon micromirror; size 1.2 mm; temperature 10 degC to 100 degC; Crystals; Gold; Imaging; Micromirrors; Silicon; Stress; Temperature measurement; Optical MEMS; Silicon-on-insulator multi-user MEMS processes (SOIMUMPs; Varifocal micromirror (VFM); finite element analysis; imaging; optical MEMS; silicon-on-insulator multi-user MEMS processes (SOIMUMPs); thermal actuation;
  • fLanguage
    English
  • Journal_Title
    Selected Topics in Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    1077-260X
  • Type

    jour

  • DOI
    10.1109/JSTQE.2014.2381464
  • Filename
    6985566