• DocumentCode
    1765628
  • Title

    Impacts of Multiple Strain-Gate Engineering on a Zero-Temperature-Coefficient Point

  • Author

    Chang, Tian-Sheuan ; Lu, Tsung Yi ; Chao, Tien-Sheng

  • Author_Institution
    National Chiao Tung University, Hsinchu, Taiwan
  • Volume
    34
  • Issue
    4
  • fYear
    2013
  • fDate
    41365
  • Firstpage
    481
  • Lastpage
    483
  • Abstract
    The impacts of zero-temperature-coefficient (ZTC) points of various strained devices is presented in this paper. The current and mobility are reduced at high temperature by phonon scattering. The degree of mobility reduction becomes severe on devices with multiple strain-gate engineering. The reduction of mobility becomes severe as a result of impurity scattering, which results from gate implantation impurities. The ZTC point is decreased by multiple strain-gate engineering due to the decreased V th.
  • Keywords
    Mobility; nMOSFETs; strain; temperature; zero-temperature-coefficient (ZTC) point;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2013.2247736
  • Filename
    6484132