DocumentCode
1765628
Title
Impacts of Multiple Strain-Gate Engineering on a Zero-Temperature-Coefficient Point
Author
Chang, Tian-Sheuan ; Lu, Tsung Yi ; Chao, Tien-Sheng
Author_Institution
National Chiao Tung University, Hsinchu, Taiwan
Volume
34
Issue
4
fYear
2013
fDate
41365
Firstpage
481
Lastpage
483
Abstract
The impacts of zero-temperature-coefficient (ZTC) points of various strained devices is presented in this paper. The current and mobility are reduced at high temperature by phonon scattering. The degree of mobility reduction becomes severe on devices with multiple strain-gate engineering. The reduction of mobility becomes severe as a result of impurity scattering, which results from gate implantation impurities. The ZTC point is decreased by multiple strain-gate engineering due to the decreased
th.
Keywords
Mobility; nMOSFETs; strain; temperature; zero-temperature-coefficient (ZTC) point;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2013.2247736
Filename
6484132
Link To Document