DocumentCode
1784331
Title
Development issue in mushroom-like profile fabrication in EBL double step exposure method
Author
Indykiewicz, K. ; Paszkiewicz, B. ; Szymanski, T. ; Paszkiewicz, R.
Author_Institution
Fac. of Microsyst. Electron. & Photonics, Wroclaw Univ. of Technol., Wroclaw, Poland
fYear
2014
fDate
20-22 Oct. 2014
Firstpage
1
Lastpage
4
Abstract
In the paper simple estimation method of development influence on final structures resolution in resist stack is proposed. The importance of analysis of development process in electron beam lithography is shown. Presented issues are enhancements of Monte Carlo simulations of e-beam influence on resists and as coupled calculations should be used in lithography process design. Performed analysis found good confirmations with conducted experiments.
Keywords
Monte Carlo methods; electron beam lithography; resists; EBL double step exposure; Monte Carlo simulations; electron beam lithography; mushroom-like profile fabrication; resists; Absorption; Electron beams; Fabrication; Lithography; Monte Carlo methods; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Devices & Microsystems (ASDAM), 2014 10th International Conference on
Conference_Location
Smolenice
Print_ISBN
978-1-4799-5474-2
Type
conf
DOI
10.1109/ASDAM.2014.6998645
Filename
6998645
Link To Document