DocumentCode
1784350
Title
Novel GaN-based transistors using polarization engineering
Author
Vescan, Andrei ; Hahn, Herwig ; Reuters, B. ; Kalisch, Holger
Author_Institution
GaN Device Technol., RWTH Aachen Univ., Aachen, Germany
fYear
2014
fDate
20-22 Oct. 2014
Firstpage
1
Lastpage
4
Abstract
For more than 20 years, the field of group III nitrides has been among the most exciting ones in solid-state device research. During this time, significant progress has been obtained not only from a technological point of view, but also and more importantly in terms of understanding these materials and their very specific properties.This paper gives a summary on our results on the growth of heterostructures based on quaternary barriers, the compositional control and the implications on crystal and electrical properties. The additional degree of freedom acquired by this capability is applied to a variety of device designs such as normally-off or high-ns structures with excellent transport properties. Finally, the formation of polarization-induced two-dimensional hole gases (2DHGs) in inverted heterostructures is demonstrated.
Keywords
III-V semiconductors; electric properties; gallium compounds; high electron mobility transistors; nitrogen compounds; polarisation; semiconductor device models; wide band gap semiconductors; 2D hole gases; 2DHG; GaN; crystal properties; device designs; electrical properties; group III nitrides; inverted heterostructures; polarization engineering; quaternary barriers; solid-state device; transistors; transport properties; Aluminum gallium nitride; Crystals; Gallium nitride; HEMTs; MODFETs;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Devices & Microsystems (ASDAM), 2014 10th International Conference on
Conference_Location
Smolenice
Print_ISBN
978-1-4799-5474-2
Type
conf
DOI
10.1109/ASDAM.2014.6998656
Filename
6998656
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