• DocumentCode
    1784350
  • Title

    Novel GaN-based transistors using polarization engineering

  • Author

    Vescan, Andrei ; Hahn, Herwig ; Reuters, B. ; Kalisch, Holger

  • Author_Institution
    GaN Device Technol., RWTH Aachen Univ., Aachen, Germany
  • fYear
    2014
  • fDate
    20-22 Oct. 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    For more than 20 years, the field of group III nitrides has been among the most exciting ones in solid-state device research. During this time, significant progress has been obtained not only from a technological point of view, but also and more importantly in terms of understanding these materials and their very specific properties.This paper gives a summary on our results on the growth of heterostructures based on quaternary barriers, the compositional control and the implications on crystal and electrical properties. The additional degree of freedom acquired by this capability is applied to a variety of device designs such as normally-off or high-ns structures with excellent transport properties. Finally, the formation of polarization-induced two-dimensional hole gases (2DHGs) in inverted heterostructures is demonstrated.
  • Keywords
    III-V semiconductors; electric properties; gallium compounds; high electron mobility transistors; nitrogen compounds; polarisation; semiconductor device models; wide band gap semiconductors; 2D hole gases; 2DHG; GaN; crystal properties; device designs; electrical properties; group III nitrides; inverted heterostructures; polarization engineering; quaternary barriers; solid-state device; transistors; transport properties; Aluminum gallium nitride; Crystals; Gallium nitride; HEMTs; MODFETs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Devices & Microsystems (ASDAM), 2014 10th International Conference on
  • Conference_Location
    Smolenice
  • Print_ISBN
    978-1-4799-5474-2
  • Type

    conf

  • DOI
    10.1109/ASDAM.2014.6998656
  • Filename
    6998656