DocumentCode :
1788874
Title :
Net deposition efficiency of step-index GeO2 doped silica glass fabricated by MCVD
Author :
Zulkifli, M.I. ; Omar, Nasr Y. M. ; Khairul Anuar, M.S. ; Hanif, S. ; Muhd-Yasin, S.Z. ; Aljamimi, S.M. ; Yusoff, Z. ; Abdul-Rashid, H.A.
Author_Institution :
Photonic Lab., Telekom R&D, Cyberjaya, Malaysia
fYear :
2014
fDate :
2-4 Sept. 2014
Firstpage :
143
Lastpage :
146
Abstract :
The net deposition efficiency which describes the successful incorporation of germania in silica was studied by varying the GeCl4 flow rate while maintaining that of SiCl4 constant. Both theoretical and experimentally-derived net deposition efficiencies were determined. The radial and longitudinal homogeneities of the fabricated preform were also determined. EDX analysis was also carried out to confirm the germanium presence in the fabricated preform.
Keywords :
MOCVD; X-ray chemical analysis; germanium compounds; optical fabrication; optical glass; silicon compounds; EDX analysis; GeCl4 flow rate; MCVD; SiO2-GeO2; longitudinal homogeneities; net deposition efficiency; radial homogeneities; step-index GeO2 doped silica glass; Electron tubes; Fabrication; Indexes; Photonics; Preforms; Refractive index; Silicon compounds; MCVD; deposition; efficiency; germania;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics (ICP), 2014 IEEE 5th International Conference on
Conference_Location :
Kuala Lumpur
Type :
conf
DOI :
10.1109/ICP.2014.7002337
Filename :
7002337
Link To Document :
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