Title :
A compact and alignment-tolerant Si polarization rotator for rib and channel waveguides
Author :
Haifeng Zhou ; Huijuan Zhang ; Lianxi Jia ; Chao Li ; Xianshu Luo ; Guoqiang Lo
Author_Institution :
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
Abstract :
A compact (around 10μm long) and alignment-tolerant (no performance degradation under a misalignment of a waveguide width, typically > 300nm) polarization rotator with a single-sided slab is proposed by using two-step self-aligned photolithography.
Keywords :
elemental semiconductors; light polarisation; optical fabrication; optical rotation; optical waveguides; photolithography; rib waveguides; silicon; Si; alignment-tolerant Si polarization rotator; channel waveguides; rib waveguides; single-sided slab; two-step self-aligned photolithography; Optical device fabrication; Optical waveguides; Rectangular waveguides; Silicon; Slabs; Time-domain analysis; Waveguide transitions;
Conference_Titel :
Optical Fiber Communications Conference and Exhibition (OFC), 2014
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-5575-2994-7
DOI :
10.1364/OFC.2014.Th2A.7
