DocumentCode
1802010
Title
Impedance characteristics of carbon nitride films for humidity sensors
Author
Lee, Ji Gong ; Lee, Sung Pil
Author_Institution
Dept. of Electron. & Electr. Eng., Kyungnam Univ., Masan, South Korea
Volume
2
fYear
2005
fDate
5-9 June 2005
Firstpage
1844
Abstract
Carbon nitride films were deposited on silicon substrate for humidity sensors with meshed electrodes by reactive RF magnetron sputtering system with DC bias. The surface of carbon nitride films had a good uniformity with the grain size of about 30 nm. The EDS analysis revealed that the chemical formula of the carbon nitride film is C2N when it was deposited with 50% N2 ratio for 1 hr. The impedance of the sample having the total sensing area of 1.00 mm2 gradually decreased from 120 kΩ to 2 kΩ in the relative humidity range of 5% to 95%. Hysteresis was about 4.2% of full scale. As the film thickness increased, impedance change ranges and each impedance values also increased. As far as the results are concerned, carbon nitride films have a several advantages for a new humidity sensing material.
Keywords
carbon compounds; electric impedance; electrodes; humidity measurement; humidity sensors; sputtering; C2N; DC bias; EDS analysis; carbon nitride films; chemical formula; film thickness; grain size; humidity sensing material; humidity sensors; hysteresis; impedance characteristics; meshed electrodes; reactive RF magnetron sputtering system; relative humidity; surface analysis; Chemical analysis; Chemical sensors; Humidity; Magnetic sensors; Semiconductor films; Sensor phenomena and characterization; Sensor systems; Silicon; Substrates; Surface impedance;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Print_ISBN
0-7803-8994-8
Type
conf
DOI
10.1109/SENSOR.2005.1497454
Filename
1497454
Link To Document