DocumentCode
181371
Title
One-chip operation of GaN-based P-channel and N-channel heterojunction field effect transistors
Author
Nakajima, Akitoshi ; Nishizawa, Sin-ichi ; Ohashi, H. ; Yonezawa, Hikaru ; Tsutsui, K. ; Kakushima, K. ; Wakabayashi, H. ; Iwai, Hisato
Author_Institution
Energy Technol. Res. Inst., AIST, Tsukuba, Japan
fYear
2014
fDate
15-19 June 2014
Firstpage
241
Lastpage
244
Abstract
Monolithic operation of GaN-based P-channel (Pch) and N-channel (Nch) heterojunction field effect transistors (HFETs) are demonstrated for the first time. The Pch and Nch HFETs were fabricated on a polarization junction platform with polarization induced 2D hole gas (2DHG) and 2D electron gas (2DEG). Because of temperature independent densities of the 2DHG and 2DEG, the HFETs can be operated in wide temperature range. Based on a measured 2DHG mobility, footprints of low-voltage Pch HFETs for gate drive applications were estimated by device simulation.
Keywords
III-V semiconductors; field effect transistors; gallium compounds; wide band gap semiconductors; 2D electron gas; 2D hole gas; 2DEG; 2DHG; GaN; device simulation; gallium nitride Nch HFET; gallium nitride Pch HFET; gallium nitride-based N-channel heterojunction field effect transistors; gallium nitride-based P-channel heterojunction field effect transistors; gate drive application; low-voltage Pch HFET; monolithic operation; one-chip operation; polarization junction platform; temperature density; Electrodes; Gallium nitride; HEMTs; Logic gates; MODFETs; Temperature measurement; Two dimensional hole gas;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices & IC's (ISPSD), 2014 IEEE 26th International Symposium on
Conference_Location
Waikoloa, HI
ISSN
1943-653X
Print_ISBN
978-1-4799-2917-7
Type
conf
DOI
10.1109/ISPSD.2014.6856021
Filename
6856021
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