• DocumentCode
    181371
  • Title

    One-chip operation of GaN-based P-channel and N-channel heterojunction field effect transistors

  • Author

    Nakajima, Akitoshi ; Nishizawa, Sin-ichi ; Ohashi, H. ; Yonezawa, Hikaru ; Tsutsui, K. ; Kakushima, K. ; Wakabayashi, H. ; Iwai, Hisato

  • Author_Institution
    Energy Technol. Res. Inst., AIST, Tsukuba, Japan
  • fYear
    2014
  • fDate
    15-19 June 2014
  • Firstpage
    241
  • Lastpage
    244
  • Abstract
    Monolithic operation of GaN-based P-channel (Pch) and N-channel (Nch) heterojunction field effect transistors (HFETs) are demonstrated for the first time. The Pch and Nch HFETs were fabricated on a polarization junction platform with polarization induced 2D hole gas (2DHG) and 2D electron gas (2DEG). Because of temperature independent densities of the 2DHG and 2DEG, the HFETs can be operated in wide temperature range. Based on a measured 2DHG mobility, footprints of low-voltage Pch HFETs for gate drive applications were estimated by device simulation.
  • Keywords
    III-V semiconductors; field effect transistors; gallium compounds; wide band gap semiconductors; 2D electron gas; 2D hole gas; 2DEG; 2DHG; GaN; device simulation; gallium nitride Nch HFET; gallium nitride Pch HFET; gallium nitride-based N-channel heterojunction field effect transistors; gallium nitride-based P-channel heterojunction field effect transistors; gate drive application; low-voltage Pch HFET; monolithic operation; one-chip operation; polarization junction platform; temperature density; Electrodes; Gallium nitride; HEMTs; Logic gates; MODFETs; Temperature measurement; Two dimensional hole gas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices & IC's (ISPSD), 2014 IEEE 26th International Symposium on
  • Conference_Location
    Waikoloa, HI
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4799-2917-7
  • Type

    conf

  • DOI
    10.1109/ISPSD.2014.6856021
  • Filename
    6856021