• DocumentCode
    1815281
  • Title

    Incorporation of colloidal quantum dots into silicon photonic structures

  • Author

    Qiao, Hong ; Gal, Mike ; Gooding, J. Justin ; Reece, Peter

  • Author_Institution
    Sch. of Phys., Univ. of New South Wales, Sydney, NSW, Australia
  • fYear
    2010
  • fDate
    22-26 Feb. 2010
  • Firstpage
    55
  • Lastpage
    57
  • Abstract
    Strong room temperature light emission from planar mesoporous silicon microcavities with II-VI compound colloidal quantum dots selectively deposited in the spacer layer has been achieved. We describe the origin of the significant enhancement in emission intensity in terms of cavity modified spontaneous emission. We investigate the role of surface chemistry and pore morphology in achieving efficient light emission from these hybrid devices.
  • Keywords
    II-VI semiconductors; colloidal crystals; elemental semiconductors; etching; mesoporous materials; microcavities; photonic crystals; semiconductor quantum dots; silicon; spontaneous emission; surface chemistry; II-VI compound colloidal quantum dots; Si; anodic etching; cavity modified spontaneous emission; colloidal quantum dots; planar mesoporous silicon microcavities; pore morphology; room temperature light emission; silicon photonic structures; surface chemistry; temperature 293 K to 298 K; Microcavities; Optical films; Optical filters; Quantum dots; Silicon; Surface morphology; Surface treatment; optical microcavity; quantum dots; silicon photonics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoscience and Nanotechnology (ICONN), 2010 International Conference on
  • Conference_Location
    Sydney, NSW
  • Print_ISBN
    978-1-4244-5261-3
  • Electronic_ISBN
    978-1-4244-5262-0
  • Type

    conf

  • DOI
    10.1109/ICONN.2010.6045174
  • Filename
    6045174