DocumentCode
1815281
Title
Incorporation of colloidal quantum dots into silicon photonic structures
Author
Qiao, Hong ; Gal, Mike ; Gooding, J. Justin ; Reece, Peter
Author_Institution
Sch. of Phys., Univ. of New South Wales, Sydney, NSW, Australia
fYear
2010
fDate
22-26 Feb. 2010
Firstpage
55
Lastpage
57
Abstract
Strong room temperature light emission from planar mesoporous silicon microcavities with II-VI compound colloidal quantum dots selectively deposited in the spacer layer has been achieved. We describe the origin of the significant enhancement in emission intensity in terms of cavity modified spontaneous emission. We investigate the role of surface chemistry and pore morphology in achieving efficient light emission from these hybrid devices.
Keywords
II-VI semiconductors; colloidal crystals; elemental semiconductors; etching; mesoporous materials; microcavities; photonic crystals; semiconductor quantum dots; silicon; spontaneous emission; surface chemistry; II-VI compound colloidal quantum dots; Si; anodic etching; cavity modified spontaneous emission; colloidal quantum dots; planar mesoporous silicon microcavities; pore morphology; room temperature light emission; silicon photonic structures; surface chemistry; temperature 293 K to 298 K; Microcavities; Optical films; Optical filters; Quantum dots; Silicon; Surface morphology; Surface treatment; optical microcavity; quantum dots; silicon photonics;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoscience and Nanotechnology (ICONN), 2010 International Conference on
Conference_Location
Sydney, NSW
Print_ISBN
978-1-4244-5261-3
Electronic_ISBN
978-1-4244-5262-0
Type
conf
DOI
10.1109/ICONN.2010.6045174
Filename
6045174
Link To Document