• DocumentCode
    1815674
  • Title

    New frontiers in InP based quantum devices

  • Author

    Razeghi, Manijeh

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Northwestern Univ., Evanston, IL
  • fYear
    2008
  • fDate
    25-29 May 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Recent research activities taking place at center for quantum devices (CQD) based on InP material system, especially the exploration and demonstration of the state-of-art high performance quantum cascade lasers (QCL), greatly facilitate the understanding of the underlining physical principles governing the device operation. Thanks to the endless effort putting into the semiconductor epitaxy technologies, including the Molecular Beam Epitaxy (MBE) and low pressure metal organic chemical vapor deposition (LP-MOCVD), the world has seen a close approaching to the ultimate ldquoband gap engineeringrdquo. Highly sophisticated manmade heterostructure, which incorporates hundreds of alternating layers of GaInAs/AlInAs with each layer thickness and composition specifically designed, can be created within a single growth. The material quality is evidenced by the atomically abrupt interfaces. The versatility of the ldquoband gap engineeringrdquo is greatly enhanced by the strain-balanced technique, which allows for growing structures with continuously tunable conduction band offset with little defects. As a result, the room temperature continuous wave (cw) wall plug efficiency (WPE) and the maximum achievable output optical power from a single device have been constantly improving. Novel waveguide incorporating the photonic crystal distributed feedback (PCDFB) mechanism is also investigated with satisfactory preliminary results.
  • Keywords
    III-V semiconductors; MOCVD; aluminium compounds; distributed feedback lasers; energy gap; gallium arsenide; gallium compounds; indium compounds; integrated optics; molecular beam epitaxial growth; optical waveguides; photonic crystals; quantum cascade lasers; GaInAs-AlInAs; InP; band gap engineering; conduction band; continuous wave wall plug efficiency; low pressure metal organic chemical vapor deposition; molecular beam epitaxy; optical waveguide; photonic crystal distributed feedback mechanism; quantum cascade lasers; quantum devices; temperature 293 K to 298 K; Chemical technology; Chemical vapor deposition; Epitaxial growth; Indium phosphide; Molecular beam epitaxial growth; Optical materials; Optical waveguides; Organic chemicals; Quantum cascade lasers; Semiconductor materials; epitaxy; high performance; quantum cascade lasers; quantum devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
  • Conference_Location
    Versailles
  • ISSN
    1092-8669
  • Print_ISBN
    978-1-4244-2258-6
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2008.4703051
  • Filename
    4703051