DocumentCode
1815674
Title
New frontiers in InP based quantum devices
Author
Razeghi, Manijeh
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Northwestern Univ., Evanston, IL
fYear
2008
fDate
25-29 May 2008
Firstpage
1
Lastpage
4
Abstract
Recent research activities taking place at center for quantum devices (CQD) based on InP material system, especially the exploration and demonstration of the state-of-art high performance quantum cascade lasers (QCL), greatly facilitate the understanding of the underlining physical principles governing the device operation. Thanks to the endless effort putting into the semiconductor epitaxy technologies, including the Molecular Beam Epitaxy (MBE) and low pressure metal organic chemical vapor deposition (LP-MOCVD), the world has seen a close approaching to the ultimate ldquoband gap engineeringrdquo. Highly sophisticated manmade heterostructure, which incorporates hundreds of alternating layers of GaInAs/AlInAs with each layer thickness and composition specifically designed, can be created within a single growth. The material quality is evidenced by the atomically abrupt interfaces. The versatility of the ldquoband gap engineeringrdquo is greatly enhanced by the strain-balanced technique, which allows for growing structures with continuously tunable conduction band offset with little defects. As a result, the room temperature continuous wave (cw) wall plug efficiency (WPE) and the maximum achievable output optical power from a single device have been constantly improving. Novel waveguide incorporating the photonic crystal distributed feedback (PCDFB) mechanism is also investigated with satisfactory preliminary results.
Keywords
III-V semiconductors; MOCVD; aluminium compounds; distributed feedback lasers; energy gap; gallium arsenide; gallium compounds; indium compounds; integrated optics; molecular beam epitaxial growth; optical waveguides; photonic crystals; quantum cascade lasers; GaInAs-AlInAs; InP; band gap engineering; conduction band; continuous wave wall plug efficiency; low pressure metal organic chemical vapor deposition; molecular beam epitaxy; optical waveguide; photonic crystal distributed feedback mechanism; quantum cascade lasers; quantum devices; temperature 293 K to 298 K; Chemical technology; Chemical vapor deposition; Epitaxial growth; Indium phosphide; Molecular beam epitaxial growth; Optical materials; Optical waveguides; Organic chemicals; Quantum cascade lasers; Semiconductor materials; epitaxy; high performance; quantum cascade lasers; quantum devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on
Conference_Location
Versailles
ISSN
1092-8669
Print_ISBN
978-1-4244-2258-6
Electronic_ISBN
1092-8669
Type
conf
DOI
10.1109/ICIPRM.2008.4703051
Filename
4703051
Link To Document