• DocumentCode
    1817698
  • Title

    Development of incoherent EUV/VUV light sources: Tailoring the output pulse characteristics for materials processing applications

  • Author

    Carman, R.J. ; Ward, B.K. ; Kane, D.M.

  • Author_Institution
    Dept. of Phys., Macquarie Univ., Sydney, NSW, Australia
  • fYear
    2010
  • fDate
    22-26 Feb. 2010
  • Firstpage
    362
  • Lastpage
    364
  • Abstract
    The temporal characteristics of the output pulses generated by an excimer-based incoherent light source operating in the deep ultraviolet between 80nm<;λ<;160nm have been investigated in detail. Generation of output pulses with the highest peak powers, shortest durations (FWHM) and fastest leading-edge risetimes, occurred at the highest operating pressure studied (900mbar).
  • Keywords
    coherence; excimers; materials science; ultraviolet sources; excimer based incoherent light source; incoherent EUV light source; incoherent VUV light source; materials processing; output pulse characteristics; Dielectrics; Discharges; Materials processing; Plasmas; Shape; Ultraviolet sources; dielectric barrier discharge; excimer; materials processing; photochemistry; plasma; surface modification; vacuum ultraviolet;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoscience and Nanotechnology (ICONN), 2010 International Conference on
  • Conference_Location
    Sydney, NSW
  • Print_ISBN
    978-1-4244-5261-3
  • Electronic_ISBN
    978-1-4244-5262-0
  • Type

    conf

  • DOI
    10.1109/ICONN.2010.6045263
  • Filename
    6045263