DocumentCode
1817698
Title
Development of incoherent EUV/VUV light sources: Tailoring the output pulse characteristics for materials processing applications
Author
Carman, R.J. ; Ward, B.K. ; Kane, D.M.
Author_Institution
Dept. of Phys., Macquarie Univ., Sydney, NSW, Australia
fYear
2010
fDate
22-26 Feb. 2010
Firstpage
362
Lastpage
364
Abstract
The temporal characteristics of the output pulses generated by an excimer-based incoherent light source operating in the deep ultraviolet between 80nm<;λ<;160nm have been investigated in detail. Generation of output pulses with the highest peak powers, shortest durations (FWHM) and fastest leading-edge risetimes, occurred at the highest operating pressure studied (900mbar).
Keywords
coherence; excimers; materials science; ultraviolet sources; excimer based incoherent light source; incoherent EUV light source; incoherent VUV light source; materials processing; output pulse characteristics; Dielectrics; Discharges; Materials processing; Plasmas; Shape; Ultraviolet sources; dielectric barrier discharge; excimer; materials processing; photochemistry; plasma; surface modification; vacuum ultraviolet;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoscience and Nanotechnology (ICONN), 2010 International Conference on
Conference_Location
Sydney, NSW
Print_ISBN
978-1-4244-5261-3
Electronic_ISBN
978-1-4244-5262-0
Type
conf
DOI
10.1109/ICONN.2010.6045263
Filename
6045263
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