DocumentCode :
1819194
Title :
ZnO thin films deposited by spray pyrolysis technique
Author :
Perniu, D. ; Duta, M. ; Catrinoi, D. ; Toader, C. ; Gosman, M. ; Ienei, E. ; Duta, A.
Author_Institution :
Centre: Product Design for Sustainable Dev., Transilvania Univ. of Brasov, Brasov
Volume :
2
fYear :
2008
fDate :
13-15 Oct. 2008
Firstpage :
279
Lastpage :
282
Abstract :
Thin films of undoped and Al- and Ag-doped ZnO thin films have been obtained by spray pyrolysis deposition. The optimised parameters of deposition for the thin films to be used in optoelectronic applications are presented in the paper. The addition of low amounts of Al and Ag ions influences the film crystallinity and morphology. Based on the experimental results it is concluded that aluminium and silver act as dopants and reduce the band gap value of the host oxide, ZnO.
Keywords :
II-VI semiconductors; aluminium; energy gap; gold; pyrolysis; semiconductor doping; semiconductor thin films; spray coating techniques; wide band gap semiconductors; zinc compounds; ZnO:Ag; ZnO:Al; band gap; crystallinity; doping; optoelectronic applications; spray pyrolysis technique; thin film deposition; Atomic force microscopy; Crystallization; Grain size; Morphology; Optical films; Photonic band gap; Spraying; Sputtering; Substrates; Zinc oxide; ZnO; spray pyrolysis deposition; thin film;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 2008. CAS 2008. International
Conference_Location :
Sinaia
ISSN :
1545-827X
Print_ISBN :
978-1-4244-2004-9
Type :
conf
DOI :
10.1109/SMICND.2008.4703402
Filename :
4703402
Link To Document :
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