Title :
Gas cleaning technique for batch furnace at Agile-fab concept manufacturing
Author :
Nakao, Takashi ; Katsui, Shuji ; Kamimura, Masaki ; Yamamoto, Akihito ; Tsunashima, Yoshitaka ; Mikata, Yuichi
Author_Institution :
Semicond. company, Toshiba Corp., Kanagawa, Japan
Abstract :
To satisfy both the quick turn around time and the process compatibility with the current product line at LPCVD process, the mini-batch furnace is one of the reasonable options. For the high tool utility and the capital scalability at small manufacturing line, the minibatch furnaces are required short time and high frequency tool cleaning for the low machine down time and process commonality for different kind of films LPCVD. In this paper, the short time and high frequency tool cleaning is proposed not only for productivity but also for particle controls
Keywords :
batch processing (industrial); chemical vapour deposition; furnaces; semiconductor device manufacture; surface cleaning; Agile fab; LPCVD process; capital scalability; gas cleaning; mini-batch furnace; particle control; productivity; semiconductor manufacturing; tool utility; turn around time; Cleaning; Costs; Frequency; Furnaces; Manufacturing processes; Productivity; Protocols; Semiconductor device manufacture; Semiconductor films; Silicon;
Conference_Titel :
Semiconductor Manufacturing Symposium, 2001 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-6731-6
DOI :
10.1109/ISSM.2001.963011
