• DocumentCode
    1840910
  • Title

    A fact-finding survey on the heat generation from processing equipment at a semiconductor fab under operation

  • Author

    Mori, Naoki ; Imakawa, Yoshihito ; Fujimori, Takaaki ; Ootake, Isao ; Suenaga, Osamu ; Ohmi, Tadahiro ; Itoh, Hiromu ; Takahashi, Masahiro

  • Author_Institution
    Taisei Corp., Yokohama, Japan
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    473
  • Lastpage
    476
  • Abstract
    The energy balance in vertical oxidation furnaces in a semiconductor fab under full scale operation was measured for the heat loads for cooling water, exhaust air and clean room air, which have not yet fully been reported. The results showed that the heat generated from the furnaces was removed with ratio of 64% by cooling water, 14% by exhausting air and 22% by clean room air, indicating very similar values measured in a laboratory scale operation reported by the authors at ISSM´99. Based on these results, the amount of energy saving was estimated by applying the energy saving methods proposed at ISSM´99. More than 35% of energy consumption can be reduced, which corresponds to more than 50% reduction of CO2 release or 50% operation cost reduction compared to the current system
  • Keywords
    clean rooms; cooling; environmental factors; furnaces; integrated circuit manufacture; oxidation; CO2; clean room air; cooling water; energy balance; exhaust air; full scale operation; heat generation; heat loads; operation cost reduction; processing equipment; semiconductor fab; vertical oxidation furnaces; Cooling; Energy consumption; Energy measurement; Fluid flow measurement; Furnaces; Oxidation; Power measurement; Temperature measurement; Temperature sensors; Water heating;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing Symposium, 2001 IEEE International
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7803-6731-6
  • Type

    conf

  • DOI
    10.1109/ISSM.2001.963018
  • Filename
    963018