• DocumentCode
    1844191
  • Title

    Nanofabrication of reactive structure for low temperature bonding

  • Author

    Lin, Yu-Ching ; Bräuer, Jörg ; Hofmann, Lutz ; Baum, Mario ; Frömel, Jörg ; Wiemer, Maik ; Esashi, Masayoshi ; Gessner, Thomas

  • Author_Institution
    WPI Adv. Inst. for Mater. Res., Tohoku Univ., Sendai, Japan
  • fYear
    2009
  • fDate
    18-21 Oct. 2009
  • Firstpage
    313
  • Lastpage
    317
  • Abstract
    Microsystems that are used for medical application mostly consist of temperature sensible components. Therefore the temperatures during the fabrication process must be limited. This paper deals with the fabrication of reactive nanostructures that have the capability to be used as local heat source and thus can be used for processes during the fabrication of temperature sensible systems. Hereby, heat is produced during a self propagating exothermal reaction of two different materials that are present in a multilayered system of horizontal or vertical arranged material films in nanoscale dimensions. In this paper the principle of the self propagating reaction of those reactive systems as well as their fabrication is shown.
  • Keywords
    integrated circuit bonding; nanofabrication; horizontal multilayered system; local heat source; low temperature bonding; microsystems; reactive structure nanofabrication process; self propagating exothermal reaction; temperature sensible system fabrication; vertical arranged material films; Bonding; Heating; Nanofabrication; nanofabrication; reactive multilayer; self-propagating exothermic reactions; silicon bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Molecular Medicine and Engineering (NANOMED), 2009 IEEE International Conference on
  • Conference_Location
    Tainan
  • Print_ISBN
    978-1-4244-5528-7
  • Type

    conf

  • DOI
    10.1109/NANOMED.2009.5559063
  • Filename
    5559063