Pulse generator for ion implantation

Plasma source ion implantation (PSII) requires a high-power pulse generator (megawatts average power and peak pulse power of over 5 MVA) that is efficient, very reliable and robust. The robustness is required because plasma arcs, spits and sputters. Because operator equipment and vacuum failures occur, the modulator must be very tolerant to every possible insult. Megapulse, Inc. has developed a solid-state, high-power modulator that meets all these requirements. By combining soft switching with magnetic pulse compression, an extremely reliable, robust and efficient modulator is obtained. This technique is used in high-power Loran-C transmitters. These transmitters have been installed throughout the world.