Title :
A novel Parylene/Al/Parylene sandwich protection mask for HF Vapor release for micro electro mechanical systems
Author :
Higo, A. ; Takahashi, K. ; Fujita, H. ; Nakano, Y. ; Toshiyoshi, H.
Author_Institution :
Res. Center for Adv. Sci. & Technol., Univ. of Tokyo, Tokyo, Japan
Abstract :
We have developed novel mask materials against HF Vapor release for MEMS/NEMS. Parylene-C has a tolerant material against moisture pass, and then, thin aluminum layer has also tolerant against HF vapor. We combined them together for high tolerance and we have successfully obtained completely non-etched silicon oxide layer under HF vapor exposure by Parylene/Al/Parylene sandwich structure.
Keywords :
micromechanical devices; nanoelectromechanical devices; polymers; sandwich structures; silicon compounds; HF vapor release; MEMS/NEMS; Parylene-C; mask materials; microelectromechanical systems; non-etched silicon oxide layer; parylene/aluminium/parylene sandwich protection mask; thin aluminum layer; Aluminum; Etching; Hafnium; Mechanical systems; Micromechanical devices; Moisture; Optical microscopy; Protection; Sandwich structures; Silicon on insulator technology; HF vapor protection; HF vapor release technique; Parylene;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-4190-7
Electronic_ISBN :
978-1-4244-4193-8
DOI :
10.1109/SENSOR.2009.5285531
