Comparison of the Pulsed Power Supply Systems Using the PFN Switching Capacitor Method and the IGBT Chopping Method for the J-PARC 3-GeV RCS Injection System

Each pulsed power supply of the bending magnets of the 3-GeV Rapid Cycling Synchrotron injection area at the Japan Proton Accelerator Research Complex has been designed and manufactured for the painting injection in the transverse plane. The magnet currents of both the shift bump magnet and the pulsed steering magnet have a shape of trapezoidal waveform, the flat-top part of which is used for beam injection. The horizontal and vertical painting bump magnets change the beam orbit by using a decaying waveform of the magnet current dynamically. The system with a pulse forming network switching capacitor produces lower current ripples due to the limited number of switchings for the waveform formations. On the other hand, the system of an Insulated Gated Bipolar Transistor chopping system cannot be free from ripple generation due to the continuous switching. However, the Insulated Gated Bipolar Transistor chopping method has an advantage, which produces any shape of required waveform. This paper summarizes the comparison of these power supply systems from view point of the switching noises.