DocumentCode :
1861180
Title :
Experimental study of thermal contact resistance between AlN and Kovar alloy by laser flash method
Author :
Zhang Lin ; Lu Yan-ping ; Du Bin
Author_Institution :
Beijing Vacuum Electron. Res. Inst., Beijing, China
fYear :
2015
fDate :
27-29 April 2015
Firstpage :
1
Lastpage :
2
Abstract :
In this paper, the thermal contact resistance of solid interface between AlN and Kovar alloy and some main influencing factors of it were investigated. The thermal contact resistance of the interface between AlN ceramic and Kovar alloy decreases with increasing temperature and increasing pressure respectively, and thermal contact resistance between the unpolished samples is higher than that between polished samples. A function relation between pressure P applied on the AlN ceramic and Kovar alloy interface and the thermal contact resistance R is also presented.
Keywords :
III-V semiconductors; aluminium compounds; contact resistance; laser materials processing; measurement by laser beam; thermal analysis; thermal resistance measurement; AlN; Kovar alloy; ceramic; laser flash method; thermal contact resistance; Aluminum nitride; Ceramics; Contact resistance; III-V semiconductor materials; Temperature measurement; Thermal resistance; AlN; Kovar alloy; laser flash method; thermal contact resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electronics Conference (IVEC), 2015 IEEE International
Conference_Location :
Beijing
Print_ISBN :
978-1-4799-7109-1
Type :
conf
DOI :
10.1109/IVEC.2015.7223827
Filename :
7223827
Link To Document :
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