DocumentCode :
1861890
Title :
Local extraction of base and thermal resistance of bipolar transistors
Author :
Setekera, Robert ; van der Toorn, Ramses ; Kloosterman, Willy
Author_Institution :
EEMCS, Delft Univ. of Technol., Delft, Netherlands
fYear :
2013
fDate :
Sept. 30 2013-Oct. 3 2013
Firstpage :
21
Lastpage :
24
Abstract :
We extend the category of parameter extraction methods that utilize weak avalanche under fixed emitter current conditions to extract base resistance. Our new method consistently accounts for self-heating and Early effect so as to arrive at an accurate extraction of both base and thermal resistance. It involves only small variations in bias and temperature conditions, so that parameter extraction as a function of bias and temperature is enabled. The method is directly applicable to transistors - no dedicated test structures are needed - so that the method is cost effective. The method is demonstrated on RF SiGe HBTs.
Keywords :
Ge-Si alloys; heterojunction bipolar transistors; thermal resistance; RF HBT; SiGe; base resistance; bias conditions; bipolar transistors; early effect; fixed emitter current conditions; local extraction; parameter extraction methods; self-heating; temperature conditions; thermal resistance; Current measurement; Digital video broadcasting; Integrated circuits; Temperature measurement; Thermal resistance; Voltage measurement; Early effect; avalanche multiplication; base resistance; bipolar transistor; self-heating; thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2013 IEEE
Conference_Location :
Bordeaux
ISSN :
1088-9299
Print_ISBN :
978-1-4799-0126-5
Type :
conf
DOI :
10.1109/BCTM.2013.6798135
Filename :
6798135
Link To Document :
بازگشت