DocumentCode
1863045
Title
Micro-Raman scattering study of strain induced by compositional variation in single crystalline Si1-xGex discs
Author
Islam, M.R. ; Yamada, M.
Author_Institution
Dept. of Electron. & Information Sci., Kyoto Inst. of Technol., Japan
fYear
2003
fDate
25-27 Aug. 2003
Firstpage
78
Lastpage
83
Abstract
Micro-Raman scattering (MRS) study has been made to investigate residual strain in single crystalline Si1-xGex discs. It is found that the residual strain is induced by the compositional variation along the radial direction of disc sample, although there is no strain when the composition is uniform over the disc sample. It is also found that the induced strain is relaxed near the edge of disc sample. The residual strain value is evaluated to be of the order of 10-3 for the parabolic-like variation of composition ranged from 0.112 at the center to the 0.143 at the edge of the disc sample.
Keywords
Ge-Si alloys; Raman spectra; internal stresses; semiconductor materials; Si1-xGex; compositional variation induced strain; microRaman scattering; residual strain; single crystalline discs; Capacitive sensors; Crystallization; Laser modes; Lattices; Lenses; Optical scattering; Phonons; Raman scattering; Strain measurement; Tail;
fLanguage
English
Publisher
ieee
Conference_Titel
Compound Semiconductors: Post-Conference Proceedings, 2003 International Symposium on
Print_ISBN
0-7803-8614-0
Type
conf
DOI
10.1109/ISCSPC.2003.1354435
Filename
1354435
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