Microfabricated electrostatic planar lens array and extractors for multi-focused ion beam system using ionic liquid ion source emitter array

This paper describes development of the electrostatic planar extractors and lenses integrated with the ionic liquid ion source (ILIS) array to realize multi focused ion beam system. The extractors and the lenses reduced ion beam divergence angle from 11° to 7.9°. Also, switching control of ion beam was demonstrated by operating separated extractors. Finally we performed Si substrate etching using various kinds of ionic liquid. As a result, 3.3 times larger sputtering yield of 7.3 atom/ion at 83% lower acceleration voltage than those of conventional Ga⁺ focused ion beam (FIB) was achieved.