DocumentCode :
1870275
Title :
Development of an atmospheric pressure air microplasma jet for the selective etching of parylene-C film
Author :
Honglei Guo ; Jingquan Liu ; Zhaoyu Wang ; Xingzhao Wang ; Xiang Chen ; Bin Yang ; Chunsheng Yang
Author_Institution :
Dept. of Micro/Nano Electron., Shanghai Jiao Tong Univ., Shanghai, China
fYear :
2015
fDate :
18-22 Jan. 2015
Firstpage :
268
Lastpage :
271
Abstract :
This paper develops a novel and simple process device based on an atmospheric pressure air microplasma jet for the selective etching of parylene-C film. In order to realize the selective etching, a quartz glass microtube (100 μm, inner diameter) is employed to generate the air microplasma jet. Experimental results demonstrated Micro-holes, micro-trenches on parylene-C film were successfully fabricated by the air microplasma jet without causing any heat damage to films and using any masks, and the etching rate reached 5.14μm/min. Due to its operating at ambient conditions, this process device can be easily integrated with roll-to-roll systems for large-scale manufacturing of flexible electronic devices in the future.
Keywords :
plasma jets; plasma materials processing; sputter etching; atmospheric pressure air microplasma jet; electronic devices; microholes; microtrenches; parylene-C film selective etching; quartz glass microtube; Electrodes; Etching; Films; Microstructure; Morphology; Plasmas; Polymers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2015 28th IEEE International Conference on
Conference_Location :
Estoril
Type :
conf
DOI :
10.1109/MEMSYS.2015.7050940
Filename :
7050940
Link To Document :
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