• DocumentCode
    1870979
  • Title

    Anomalous resistance change of ultrastrained individual MWCNT using MEMS-based strain engineering

  • Author

    Yamauchi, K. ; Kuno, T. ; Sugano, K. ; Isono, Y.

  • Author_Institution
    Grad. Sch. of Eng., Kobe Univ., Kobe, Japan
  • fYear
    2015
  • fDate
    18-22 Jan. 2015
  • Firstpage
    369
  • Lastpage
    372
  • Abstract
    This research clarified the anomalous electric resistance change of ultrastrained multi-walled carbon nanotube (MWCNT), as well as its mechanical properties, using the Electrostatically Actuated NAnotensile Testing device (EANAT) mounted on the in-situ SEM nanomanipulation system. The Young´s modulus of MWCNT and its shear stress during interlayer sliding deformation were estimated from the load-displacement curve. The electrical resistance of the MWCNT was 215 kΩ without strain, which was similar to the previously reported value, however the anomalous resistance change was observed under enormous strain. Although the resistance change ratio was almost constant during interlayer sliding of the MWCNT, it specifically showed a sharp raise at the end of the sliding in spite of the MWCNT not breaking mechanically. The molecular dynamics (MD) simulation provided a good understanding that the atomic reconfiguration due to the hard sticking at the edge of extracted outer layer of MWCNT might induce the sharp raise of resistance without its mechanically breaking. This result reported here is extremely important for reliability of MWCNT interconnects.
  • Keywords
    Young´s modulus; deformation; electric resistance; internal stresses; molecular dynamics method; multi-wall carbon nanotubes; scanning electron microscopy; tensile testing; C; MEMS-based strain engineering; SEM nanomanipulation system; Young´s modulus; anomalous electric resistance change; atomic reconfiguration; electrostatically actuated nanotensile testing device; extracted outer layer edge; hard sticking; interconnect reliability; interlayer sliding deformation; load-displacement curve; mechanical properties; molecular dynamics simulation; resistance 215 kohm; resistance change ratio; shear stress; ultrastrained multiwalled carbon nanotube; Actuators; Atomic layer deposition; Force; Load modeling; Mathematical model; Resistance; Strain;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2015 28th IEEE International Conference on
  • Conference_Location
    Estoril
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2015.7050966
  • Filename
    7050966