DocumentCode
1872302
Title
Light induced frustration of etching in Fe doped LiNbO/sub 3/
Author
Barry, I.E. ; Eason, R.W. ; Cook, G.
Author_Institution
Optoelectron. Res. Centre, Southampton Univ., UK
fYear
1999
fDate
28-28 May 1999
Firstpage
384
Lastpage
385
Abstract
Summary form only given. There is considerable interest in etching, structuring, and patterning a wide range of insulators, dielectrics, and semiconductors, for microelectronic and microphotonic device applications. The authors report a method of optical control of photoelectrochemical etching in lithium niobate doped with iron.
Keywords
etching; iron; lithium compounds; photoelectrochemistry; surface chemistry; Fe doped LiNbO/sub 3/; LiNbO/sub 3/:Fe; etching; light induced frustration; lithium niobate; optical control; photoelectrochemical etching; Dielectric materials; Etching; Iron; Laser ablation; Optical materials; Optical pulse generation; Optical pulses; Optical surface waves; Surface emitting lasers; Surface fitting;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-595-1
Type
conf
DOI
10.1109/CLEO.1999.834342
Filename
834342
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