DocumentCode
1887187
Title
Imaging and spectroscopic analysis of channel spark electron beam ablation plumes
Author
Kovaleski, Scott D. ; Gilgenbach, Ronald M. ; Ang, L.K. ; Lau, Y.Y. ; Overhiser, G.J.
Author_Institution
Intense Energy Beam Interaction Lab., Michigan Univ., Ann Arbor, MI, USA
fYear
1997
fDate
19-22 May 1997
Firstpage
231
Lastpage
232
Abstract
Summary form only given. Ablation of metals by a channel spark electron beam has been studied with several optical diagnostics. The channel spark is a high current (/spl sim/1500 A) low energy (<15-20 keV) electron beam source developed by KFK in Karlsruhe, Germany. The channel spark electron beam propagates in a low pressure (5-20 mTorr) background of Ar, providing ion focusing. The channel spark electron beam is intended as a pulsed energy source for material ablation and redeposition as a thin film. The metals studied in this work are Fe and Ti. Ablation dynamics have been studied via various photographic imaging diagnostics. Plume composition and ionization have been studied through optical emission spectroscopy. Ionization of the background gas has also been examined through these methods. In addition, current diagnostics have provided information on beam transport and correlation of beam properties with ablation dynamics.
Keywords
electron beam applications; electron-surface impact; iron; plasma diagnostics; sparks; titanium; 15 to 20 keV; 1500 A; 5 to 20 mtorr; Ar; Fe; Ti; ablation dynamics; beam properties; beam transport; channel spark electron beam ablation plumes; current diagnostics; high current low energy electron beam source; imaging; ion focusing; low pressure Ar background; metal ablation; optical diagnostics; optical emission spectroscopy; photographic imaging diagnostics; plume composition; pulsed energy source; redeposition; spectroscopic analysis; Electron beams; Electron optics; Image analysis; Ionization; Optical films; Optical imaging; Optical propagation; Particle beam optics; Sparks; Spectroscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location
San Diego, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-3990-8
Type
conf
DOI
10.1109/PLASMA.1997.604954
Filename
604954
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