Emission-free distilled DIW closed system for ISO 14001

Author

Koba, Kazunori ; Momose, Shoich ; Inoue, Shiro ; Ban, Cozy ; Sato, Kazunao

Author_Institution

Hitachi Zosen Corp., Osaka, Japan

fYear

1997

fDate

6-8 Oct 1997

Abstract

It is required that semiconductor factories generate “zero” industrial waste materials. Distillation systems are excellent from an emission-free stand point because they require no chemicals to purify the water and no periodical replacement of materials. We developed the first distilled deionized water (DIW) system for semiconductor manufacturing, and demonstrated the quality of distilled DIW for quarter micron device production. Then we designed a variety of an emission-free distilled DIW closed systems utilizing different processes, and investigated the costs of these systems

Keywords

ISO standards; distillation; integrated circuit manufacture; surface cleaning; water pollution control; water treatment; ISO 14001; cleaning; closed system; costs; distilled deionized water system; emission-free system; quarter micron device production; rinsing systems; semiconductor factories; semiconductor manufacturing; water usage efficiency; zero industrial waste; Biomembranes; Chemicals; Cleaning; ISO standards; Industrial waste; Production systems; Resins; Semiconductor materials; Ultra large scale integration; Water conservation;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on

Conference_Location

San Francisco, CA

Print_ISBN

0-7803-3752-2

Type

conf

DOI

10.1109/ISSM.1997.664514

Filename

664514