• DocumentCode
    1893455
  • Title

    Cellular Monte Carlo study of RF short-channel effects, effective gate length, and aspect ratio in GaN and InGaAs HEMTs

  • Author

    Guerra, Diego ; Akis, Richard ; Ferry, David K. ; Goodnick, Sthepen M. ; Saraniti, Marco ; Marino, Fabio A.

  • Author_Institution
    Center for Comput. Nanosci., Arizona State Univ., Tempe, AZ, USA
  • fYear
    2010
  • fDate
    26-29 Oct. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    An investigation of RF short-channel effects in state-of-the-art GaN and InGaAs HEMTs, in relation to effective gate length and aspect ratio, is performed through our full band Cellular Monte Carlo simulator. In particular, the short-circuit current gain cut-off frequency, fT, is extracted using two different methods for several gate lengths. The first method relates fT to the electron transit time in the gate region, and from the electron velocity profile allows a direct estimation of fT, the effective gate length Leff, and the investigation of the nananoscale carrier dynamics in the channel. The second extraction methods derives fT through small-signal analysis. Our results indicates that the increasing difference between effective gate length and metallurgical gate length, as the device is scaled, plays a major role in limiting the RF performance. Moreover, maintaining a minimum aspect ratio of 5 for InGaAs HEMTs, and 10 for GaN devices, helps mitigating the short-channel effects.
  • Keywords
    III-V semiconductors; Monte Carlo methods; gallium compounds; high electron mobility transistors; indium compounds; wide band gap semiconductors; GaN; HEMT; InGaAs; RF short-channel effects; aspect ratio; cellular Monte Carlo study; effective gate length; electron transit time; small-signal analysis; Cutoff frequency; Gallium nitride; HEMTs; Logic gates; MODFETs; Performance evaluation; Radio frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computational Electronics (IWCE), 2010 14th International Workshop on
  • Conference_Location
    Pisa
  • Print_ISBN
    978-1-4244-9383-8
  • Type

    conf

  • DOI
    10.1109/IWCE.2010.5678006
  • Filename
    5678006