• DocumentCode
    189397
  • Title

    CMOS-NEM relay based on tungsten VIA layer

  • Author

    Riverola, Martin ; Vidal-Alvarez, Gabriel ; Torres, Francesc ; Barniol, Nuria

  • Author_Institution
    Dept. d´Eng. Electron., Univ. Autonoma de Barcelona, Bellaterra, Spain
  • fYear
    2014
  • fDate
    2-5 Nov. 2014
  • Firstpage
    162
  • Lastpage
    165
  • Abstract
    A CMOS-NEM tungsten relay based on a 3-T configuration for logic applications is presented. The relay is integrated monolithically in the BEOL of a standard CMOS technology (AMS 0.35 μm) using the tungsten VIA3 layer. The relay is designed and fabricated during the CMOS process and released by a one-step mask-less wet etching. The measured devices show an essentially zero leakage current and a subthreshold slope less than 5 mV/decade with a 104 ratio between on-off current, although they exhibit a high contact resistance (~ 108 Ω). A cycling test was carried out up to 1800 cycles in ambient conditions. Throughout this test, the switch shows great endurance. Finally, the frequency response was also measured.
  • Keywords
    CMOS integrated circuits; contact resistance; etching; frequency measurement; integrated circuit design; leakage currents; nanoelectromechanical devices; nanofabrication; relays; tungsten; wetting; AMS technology; BEOL; CMOS-NEM tungsten relay; W; back end of line; contact resistance; cycling testing; frequency response measurement; logic application; one-step mask-less wet etching; size 0.35 mum; standard CMOS technology; tungsten VIA3 layer; zero leakage current; CMOS integrated circuits; CMOS technology; Electrodes; Relays; Switches; Tungsten; Voltage measurement; CMOS technology; relays; switches; tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SENSORS, 2014 IEEE
  • Conference_Location
    Valencia
  • Type

    conf

  • DOI
    10.1109/ICSENS.2014.6984958
  • Filename
    6984958