• DocumentCode
    189573
  • Title

    Sharp needle tip formation based on triangular pyramidal structure

  • Author

    Imaeda, K. ; Bessho, K. ; Shikida, M.

  • Author_Institution
    Dept. of Micro-nano Syst. Eng., Nagoya Univ., Nagoya, Japan
  • fYear
    2014
  • fDate
    2-5 Nov. 2014
  • Firstpage
    558
  • Lastpage
    561
  • Abstract
    A Si triangular pyramidal structure was proposed to produce a sharp needle tip for MEMS applications. It has the advantage that it can always become sharp because the vertex of a triangular pyramid becomes a point and is not affected by fabrication errors. The triangular etching mask in which three planes dominate the etched shape was designed based on an eight-sided pyramid formation. Finally, a Si triangular pyramidal needle was fabricated by photolithography and anisotropic TMAH (25.0 wt.%, 70°C) wet etching. The height of the needle was 0.1 mm. It is clear that the vertex of the triangular pyramid successfully became a point because of its shape. A sharp needle tip with a radius of less than 1.0 μm was obtained.
  • Keywords
    elemental semiconductors; etching; masks; microfabrication; micromechanical devices; needles; photolithography; silicon; wetting; MEMS application; Si; anisotropic TMAH; distance 0.1 mm; eight-sided pyramid formation; microfabrication; photolithography; sharp needle tip formation; temperature 70 degC; triangular etching mask; triangular pyramidal structure; wet etching; Etching; Irrigation; Needles; Resists; Silicon; Micro-needle; anisotropic wet etching; atomic force microscope; probe; triangular pyramid;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SENSORS, 2014 IEEE
  • Conference_Location
    Valencia
  • Type

    conf

  • DOI
    10.1109/ICSENS.2014.6985059
  • Filename
    6985059