DocumentCode
18978
Title
Enhanced Fluorescence Emission from Silicon-Rich Nitride Guided Mode Resonance Gratings
Author
Chuantong Cheng ; Chunxia Wang ; Qiang Kan ; Beiju Huang ; Zhenzhen Wang ; Hongsheng Gao ; Hongda Chen
Author_Institution
State Key Lab. of Integrated Optoelectron., Inst. of Semicond., Beijing, China
Volume
32
Issue
3
fYear
2014
fDate
Feb.1, 2014
Firstpage
461
Lastpage
466
Abstract
A one-dimensional subwavelength grating structure is used to enhance the emission from Si nanocrystals embedded in silicon-rich nitride film. The enhancement is attributed to guided-mode resonance effects supported by subwavelength gratings. Both the reflection and photoluminescence experiments are presented aimed at acquiring guided mode spectrum and the emission enhancement factor. A ten-fold enhancement of the fluorescence emission by Si nanocrystals is obtained at the low group velocity band edge of subwavelength gratings. Our results indicate that silicon-rich nitride is a suitable material for the fabrication of high efficiency light emitting structures. The versatility of silicon-rich nitride material system has a far-reaching significance for the realization of optically active complementary metal oxide semiconductor devices.
Keywords
diffraction gratings; fluorescence; nanophotonics; silicon; Si; complementary metal oxide semiconductor device; enhanced fluorescence emission; guided mode resonance effect; guided mode resonance gratings; light emitting structure; one-dimensional subwavelength grating structure; optically active semiconductor device; Couplings; Gratings; Optimized production technology; Photonic band gap; Photonics; Silicon; Band edge effect; Si nanocrystals (NCs); guided-mode resonance; photoluminescence (PL); subwavelength grating (SWG);
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.2013.2294177
Filename
6680668
Link To Document