• DocumentCode
    190104
  • Title

    High quantum efficiency 200–1000 nm spectral response photodiodes with on-chip multiple high transmittance optical layers

  • Author

    Koda, Yasumasa ; Kuroda, Rihito ; Sugawa, Shigetoshi

  • Author_Institution
    Grad. Sch. of Eng., Tohoku Univ., Sendai, Japan
  • fYear
    2014
  • fDate
    2-5 Nov. 2014
  • Firstpage
    1664
  • Lastpage
    1667
  • Abstract
    High quantum efficiency (QE) 200-1000 nm spectral response photodiodes using on-chip multiple high transmittance optical layers are demonstrated for development of a high sensitivity linear photodiode array (PDA). In this paper, seven types of PDs with an optical layer each having a band-pass filter type transmittance are described. A surface photo-generated carrier drift layer is employed to improve internal QE and stability of sensitivity to UV-light. The average QE of 79% for 200-1000 nm and 84% for 200-380 nm were obtained for the fabricated PDs. In addition, after acceleration UV-light exposure, degradation of QE is below 15% and increment of dark current is less than double.
  • Keywords
    band-pass filters; optical filters; photodiodes; PDA; QE; UV-light stability; acceleration UV-light exposure; band-pass filter type transmittance; dark current; efficiency 79 percent; efficiency 84 percent; high sensitivity linear photodiode array; on-chip multiple high transmittance optical layer; quantum efficiency; spectral response photodiode; surface photo- generated carrier drift layer; wavelength 200 nm to 1000 nm; Optical device fabrication; Optical films; Optical filters; Optical imaging; Optical sensors; Photodiodes; Silicon; Spectroscopy; on-chip multiple optical layers; photodiode;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SENSORS, 2014 IEEE
  • Conference_Location
    Valencia
  • Type

    conf

  • DOI
    10.1109/ICSENS.2014.6985340
  • Filename
    6985340