DocumentCode
1902883
Title
Investigation about the high-temperature impact-ionization coefficient in silicon
Author
Reggiani, S. ; Rudan, M. ; Gnani, E. ; Baccarani, G.
Author_Institution
DEIS, Bologna Univ., Italy
fYear
2004
fDate
21-23 Sept. 2004
Firstpage
245
Lastpage
248
Abstract
In this work, we address the problem of field- and temperature-dependence of the impact-ionization coefficient in silicon. A careful prediction of the impact-ionization phenomenon is essential for the design of devices working in high-current/voltage conditions, where self heating is relevant. A new model is proposed, fitted on first-principle calculations, that demonstrates the essential role played by the non-equilibrium Auger effect, which is neglected in standard approaches. The model is corroborated by a theoretical analysis, that confirms the numerical findings about the field and temperature dependencies.
Keywords
Auger effect; elemental semiconductors; impact ionisation; semiconductor device models; silicon; Si; high-current/voltage operating conditions; high-temperature impact-ionization coefficient; impact-ionization field-dependence; impact-ionization temperature-dependence; nonequilibrium Auger effect; self heating; Electrons; Electrostatic discharge; Heating; Ionization; Predictive models; Scattering; Silicon; Temperature dependence; Temperature distribution; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research conference, 2004. ESSDERC 2004. Proceeding of the 34th European
Print_ISBN
0-7803-8478-4
Type
conf
DOI
10.1109/ESSDER.2004.1356535
Filename
1356535
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