• DocumentCode
    1903586
  • Title

    Advanced III-V HEMT Technology for Microwave and Millimetre-Wave Applications

  • Author

    Long, A.P. ; Eddison, I.G.

  • Author_Institution
    GEC-Marconi Materials Technology Ltd., Caswell, Towester, Northants, NN12 8EQ, United Kingdom
  • fYear
    1992
  • fDate
    14-17 Sept. 1992
  • Firstpage
    389
  • Lastpage
    395
  • Abstract
    This paper describes the current European status of HEMT technology for analogue MMIC applications at microwave and mm-wave frequencies. Results from three European Foundries (GEC-Marconi, Philips and Thomson) will be presented to illustrate the position. The key technology issues will be discussed, including the requirement for high quality epitaxial material. This latter point has been addressed commercially by both MBE (Picogiga) and MOVPE (Epitaxial Products International) growth techniques.
  • Keywords
    Epitaxial growth; Epitaxial layers; Gallium arsenide; HEMTs; III-V semiconductor materials; Indium gallium arsenide; Indium phosphide; Lattices; Microwave technology; Radio frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1992. ESSDERC '92. 22nd European
  • Conference_Location
    Leuven, Belgium
  • Print_ISBN
    0444894780
  • Type

    conf

  • Filename
    5435124