Title :
The Fabrication of High Aspect Ratio THz Metamaterials
Author :
Gallant, Andrew J. ; Wood, David ; Levitt, J.A. ; Kaliteevski, M. ; Petty, Michael C. ; Brand, Sebastian ; Abram, R.A. ; Chamberlain, J.M.
Author_Institution :
Durham Univ., Durham
Abstract :
Micromachined metamaterials will be required to provide filters and lenses for the next generation of THz imagers and microscopes. As an example of this emerging technology, we demonstrate here how UV-based surface micromachining can be used to fabricate extremely high aspect ratio pillar arrays. These artificial plasmonic materials act as efficient bandpass filters with a relative transmission of up to 97% measured in the pass band.
Keywords :
band-pass filters; metamaterials; submillimetre wave imaging; THz imagers; THz microscopes; UV-based surface micromachining; artificial plasmonic materials; bandpass filters; high aspect ratio pillar arrays; micromachined metamaterials; SU8; THz; filter; metamaterial;
Conference_Titel :
Metamaterials for Microwave and (Sub) Millimetrewave Applications: Electromagnetic Bandgap and Double Negative Design, Structures, Devices and Experimental Validation, 2006. The Institution of Engineering and Technology Seminar on
Conference_Location :
London
Print_ISBN :
0-86341-679-9
