Title :
Reduction of Electrical Crosstalk in Hybrid Backside Illuminated CMOS Imagers using Deep Trench Isolation
Author :
Minoglou, Kyriaki ; Munck, Koen De ; Tezcan, Deniz Sabuncuoglu ; Borgers, Tom ; Ruythooren, Wouter ; Bogaerts, Jan ; Veltroni, Iacopo Ficai ; Zayer, Igor ; Meynart, Roland ; Bezy, Jean-Loup ; Hoof, Chris Van ; Moor, Piet De
Author_Institution :
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium, Email: Kiki.Minoglou@imec.be, Ph: +32 (0) 16 28 82 03, Fax: +32 (0) 16 28 10 97
Abstract :
Hybrid backside illuminated CMOS imagers with zero pixel-to-pixel electrical crosstalk were developed. The application of highly doped polysilicon filled high aspect ratio trenches between pixels to reduce crosstalk is unique. These 1¿m wide 50¿m deep trenches enforce a lateral drift field between pixels, which counteracts diffusion and drastically reduces electrical crosstalk. Quantitative crosstalk characterization of trenched and non-trenched imagers is presented.
Keywords :
Crosstalk; Dark current; Detectors; Etching; Fabrication; Indium; Manufacturing; Pixel; Sensor arrays; Substrates;
Conference_Titel :
Interconnect Technology Conference, 2008. IITC 2008. International
Conference_Location :
Burlingame, CA, USA
Print_ISBN :
978-1-4244-1911-1
Electronic_ISBN :
978-1-4244-1912-8
DOI :
10.1109/IITC.2008.4546945
