Lateral Channel Doping Engineering in 0.1um Recessed Channel nMOSFETs

Author

Lyu, Jeongho ; Choi, Youngjin ; Park, Byung-Gook ; Chun, Kukjin ; Lee, Jong Duk

Author_Institution

Seoul National University, Korea

fYear

1997

fDate

22-24 September 1997

Firstpage

236

Lastpage

239

Keywords

Degradation; Doping profiles; Fabrication; Immune system; MOSFETs; Medical simulation; Semiconductor device doping; Threshold voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1997. Proceeding of the 27th European

Print_ISBN

2-86332-221-4

Type

DOI

10.1109/ESSDERC.1997.194409

Filename

1503339

Link To Document