Low field electron emission from nanocluster carbon films grown using a pulsed trigger less cathodic arc process

Nanostructured carbon based electron emitters are now in the forefront, as one of the best candidate for cold cathode based field emission applications. Various forms of carbon including, nano-diamond, carbon nanotubes, nanostructured graphite, nano horns, nanocluster carbon, diamond like carbon [DLC], tetrahedral amorphous carbon [ta-C], etc., have been all shown to emit electrons at reasonably low fields. These materials have been grown using different process like hot filament CVD, microwave plasma CVD, Plasma assisted DC discharge, cathodic arc etc., The need is for a low temperature, large areas capability, low cost process, compatible with silicon process technology. The Cathodic arc offers the unique opportunity of growing any form of carbon, from highly sp/sup 3/ bonded material like diamond to highly sp/sup 2/ bonded graphite like material such as carbon nanotube and all the intermediate stages including DLC, ta-C and nanoclusters at near room temperature. The process may also be scaled up, for large area film growth.