Title :
The effect of plasma treatment on the field emission characteristics of printed MWCNT display panel
Author :
Tsang-Lang Lin ; Ming-Li Liu ; Leou, K.-C. ; Yuan Hu ; Tsai, C.-H.
Author_Institution :
Dept. of Eng. & Syst. Sci., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
In this paper, the field emission characteristics were investigated for the printed MWCNT display panels. The effect of plasma treatment on the field emission characteristics was investigated in-situ in a vacuum chamber equipped with a inductively coupled plasma source. The field emission current was measured typically at a gap distance of 70 microns and at pressures around 10/sup -6/ torr.
Keywords :
carbon nanotubes; field emission displays; nanotube devices; plasma materials processing; 10/sup -6/ torr; 70 micron; C; field emission current; field emission properties; inductively coupled plasma source; plasma treatment; printed MWCNT display panel; vacuum chamber; Argon; Cathodes; Current measurement; Flat panel displays; Low voltage; Plasma displays; Plasma measurements; Plasma properties; Plasma sources; Threshold voltage;
Conference_Titel :
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location :
Osaka, Japan
Print_ISBN :
4-8181-9515-4
DOI :
10.1109/IVMC.2003.1223085
