Title :
Gas cleaning with semi-wet type plasma reactor
Author :
Chakrabarti, Anandaroop ; Mizuno, A. ; Shimizu, K. ; Matsuoka, T. ; Furuta, S.
Author_Institution :
Dept. of Electr. & Electron. Eng., Toyohashi Univ. of Technol., Japan
Abstract :
An experimental study on the removal of NH3, NO, and NO x in concentrations of 10-40 ppm in air has been carried out using plasma chemical reaction in a streamer corona discharge. The results of the performance of dry-type and semi-wet-type reactors are compared. The effect of different types of applied voltages such as rectangular pulse, 60 Hz sinusoidal, and 18 kHz alternating voltages is investigated. During NO removal, O3 and NO2 are produced. NO2 can, partially, be removed with higher power input into the discharge. Another undesirable pollutant, namely N2 O, is also produced, especially in the case of dry reactors having long residence time (~2.4 s). N2O production decreases, essentially, to zero at 0.6 s residence time when using a semiwet reactor. In general, higher removal efficiency has been obtained with pulse voltage in a wet reactor. NH3 in air appears to produce ozone and ammonium nitrate in a discharge. The performance of semiwet reactors with regard to the removal of submicron dust particles has also been investigated and very high removal efficiency (~93% at 0.6 s residence time) has been obtained
Keywords :
air pollution detection and control; ammonia; corona; nitrogen compounds; plasma applications; 0.6 s; 18 kHz; 18 kHz alternating voltages; 60 Hz; 60 Hz sinusoidal voltages; N2O; NH3; NO; NO2; NOx; ammonium nitrate; gas cleaning; ozone; plasma chemical reaction; rectangular pulse voltages; semi-wet type plasma reactor; streamer corona discharge; submicron dust particles; Air pollution; Cleaning; Corona; Environmentally friendly manufacturing techniques; Inductors; Industrial pollution; Plasmas; Power generation; Voltage; Wire;
Conference_Titel :
Industry Applications Society Annual Meeting, 1993., Conference Record of the 1993 IEEE
Conference_Location :
Toronto, Ont.
Print_ISBN :
0-7803-1462-X
DOI :
10.1109/IAS.1993.299134