Author_Institution :
Infineon Technologies, Germany
fDate :
11-13 September 2000
Keywords :
CMOS process; CMOS technology; Capacitors; Electrodes; Ferroelectric films; Ferroelectric materials; Nonvolatile memory; Plugs; Random access memory; Transistors;
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
DOI :
10.1109/ESSDERC.2000.194719
