• DocumentCode
    1917869
  • Title

    Copper Drifts in Porous Methylsilsesquiazane Low-k Dielectric Films

  • Author

    Kikkawa, T. ; Mukaigawa, S. ; Oda, T. ; Aoki, T. ; Shimizu, Y.

  • Author_Institution
    Hiroshima University, Higashi-Hiroshima, Japan
  • fYear
    2000
  • fDate
    11-13 September 2000
  • Firstpage
    208
  • Lastpage
    211
  • Keywords
    Capacitors; Copper; Dielectric constant; Dielectric films; Dielectric measurements; Dielectric substrates; Electric resistance; Integrated circuit interconnections; Leakage current; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2000. Proceeding of the 30th European
  • Print_ISBN
    2-86332-248-6
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2000.194751
  • Filename
    1503681
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1917869