Title :
Shallow and Deep Trench Isolation for use in RF-Bipolar IC:s
Author :
Forsberg, M. ; Bormander, C. ; Johansson, T. ; Ko, T. ; Liu, W. ; Vellaikal, M. ; Cheshire, A.
Author_Institution :
Ericsson Microelectronics AB, Kista, Sweden
fDate :
11-13 September 2000
Keywords :
BiCMOS integrated circuits; Bipolar integrated circuits; Chemistry; Driver circuits; Etching; Lithography; Microelectronics; Radio frequency; Resists; Silicon;
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
DOI :
10.1109/ESSDERC.2000.194752
