• DocumentCode
    1920294
  • Title

    P1–18: I-V Characteristics of nanogap electrodes formed by thermally assisted electromigration

  • Author

    Singh, Abhishek Kumar ; Rajput, Nitul Singh ; Banerjee, Amit ; Kulkarni, Vishwas N. ; Kumar, Jitendra

  • Author_Institution
    Mater. Sci. Programme, Indian Inst. of Technol. Kanpur, Kanpur, India
  • fYear
    2010
  • fDate
    26-30 July 2010
  • Firstpage
    64
  • Lastpage
    64
  • Abstract
    Electrodes with nano-scale gaps have been fabricated using metallic nano-wires, derived via milling of thin films with focused ion beam (FIB) and passing current ~1012A/m2. Their I-V characteristics measured at a pressure ~10-6 mbar are shown to follow Child-Langmuir law or Fowler-Nordheim field emission depending upon the gap.
  • Keywords
    electrodes; electromigration; field emission; focused ion beam technology; milling; nanofabrication; nanowires; Child-Langmuir law; Fowler-Nordheim field emission; focused ion beam; metallic nanowires; nanogap electrodes; thermally assisted electromigration; thin films; Copper; Electrodes; Gold; Ion beams; Lithography; Nanowires; Voltage measurement; Electro-migration; Focused Ion Beam (FIB); Nano-electrodes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
  • Conference_Location
    Palo Alto, CA
  • Print_ISBN
    978-1-4244-7889-7
  • Electronic_ISBN
    978-1-4244-7888-0
  • Type

    conf

  • DOI
    10.1109/IVNC.2010.5563181
  • Filename
    5563181
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1920294